Semiconductor device

ABSTRACT

The well voltage of a CMOS circuit having low-threshold-voltage MOSFETs is controlled when the power supply is turned on, during normal operation, and when the supply voltage is cut off. The CMOS circuit can thus operate stably with lower power consumption, because latching-up is reduced when the supply voltage is applied to the CMOS circuit or when the supply voltage is cut off, and subthreshold current is decreased during normal operation.

BACKGROUND OF THE INVENTION

[0001] 1. Field of the Invention

[0002] The present invention relates generally to semiconductor devices,and, more particularly, to semiconductor devices that combine high-speedperformance and low power consumption.

[0003] 2. Description of the Related Art

[0004] An example of reducing power consumption by substrate biascontrol is described in 1996 IEEE International Solid-State Circuit,Digest of Technical Papers, (1996), pp. 166-167.

[0005] With the recent popularity of low-power CMOS LSIs (ComplementaryMetal Oxide Semiconductor Large Scale Integrated circuits), a trend hasdeveloped to maintain high-speed operation by decreasing the thresholdvoltage V_(T) of the MOSFETs as the operating or supply voltage isdropped. When the supply voltage drops to 2 V or lower and when thethreshold voltage V_(T) is decreased to 0.5 V or lower correspondingly,however, the subthreshold leakage current increases, whereby thetransistor cannot be cut off completely. Consequently, the standbycurrent of the LSI chip increases, which represents a bottleneck in thedesign of a system that includes a battery-powered CMOS LSI chip.Furthermore, the current during normal operation also increases as thethreshold voltage V_(T) increases.

[0006] In order to break the bottleneck, a well-known system achieves ahigh-speed operation by decreasing the threshold voltage of each of theMOSFETs in the chip during normal operation, and decreases the standbycurrent by increasing the threshold voltage at the time of standby.Nevertheless, the following three problems exist in this system:

[0007] (1) An overcurrent flows because of latching-up when the powersupply is turned on, and the wiring in the CMOS LSI chip may fuse, orthe normal supply voltage may become inapplicable as the load exceedsthe current capacitance of the power supply. This problem is causedbecause the layout and connections of the circuit are designed so thatthe substrate (well) and source of the MOSFET are not at equipotential.

[0008] For example, when a p-channel MOSFET (PMOSFET) is used forapplying a positive supply voltage (e.g., 1.8 V) to the source(p-layer), the pn junction between the source and well is excessivelybiased in the forward direction because the well (n-well) remains at afloating 0 V just until the application of the supply voltage, thuscausing latch-up of the CMOS. In the case of conventional CMOS LSIproducts at 2 V or higher, the pn junction is never biased in theforward direction as in the normal operation thereafter, even during theapplication of the supply voltage, since the well and source of theMOSFET are connected so that both are at equipotential as much aspossible. Since the threshold voltage V_(T) is constant at all times ata value of substantially 0.5 or higher, moreover, there is no problem ofsubthreshold current.

[0009] In the case of an n-channel MOSFET (NMOSFET), the problem is notso serious. When the supply voltage is applied to the drain, thesubstrate (p-well) of the NMOSFET is at a floating 0 V and the source isfixed to an earth potential of 0 V, because the pn junction, formedbetween the drain and the well, is not biased in the forward direction.However, there is a subthreshold current flowing between the drain andsource when the threshold voltage is 0.5 V or lower. By separatelycontrolling the well and source, the threshold voltage in the CMOS LSIis lowered.

[0010] (2) The time required to switch the normal mode to the standbymode and the time required to switch the standby mode to the normal modeare extremely long, on the order of μs. Assuming that the substratevoltage is generated on-chip, by a charge pumping circuit for pumpingthe capacitor in the chip, the output current is limited to a low level.On the other hand, the transistor in the chip is used to connect thepower supply terminals of the substrate in common, and consequently thetotal substrate capacitance has an extremely large value (100 pF orgreater). Therefore, a large load (substrate) capacitance is driven by asubstrate-voltage generating circuit whose current driving capability islow when the mode is switched, so that the response time tends to becomelonger.

[0011] (3) The subthreshold current flows everywhere, even in the CMOScircuit, thus increasing the operating current of the whole chip. Thisproblem exists because, in the inactive state, the threshold voltage ofthe transistor in the CMOS circuit or circuit block is low during normaloperation.

SUMMARY OF THE INVENTION

[0012] The present invention controls the substrate or well voltage of atransistor in a manner that solves the foregoing three problems.

[0013] An object of the invention is to hinder the latching-up thatoccurs when the supply voltage is applied to a CMOS circuit thatincludes MOSFETs having a low threshold voltage, or when the supplyvoltage is cut off to the CMOS circuit.

[0014] Another object of the invention is to decrease the subthresholdcurrent during normal operation.

[0015] A further object of the invention is to realize low powerconsumption while maintaining high operating speed, for a CMOS circuitthat operates at a voltage of 2 V or below, a CMOS LSI, and asemiconductor device using the CMOS circuit.

[0016] In general, the invention achieves these and other objects bycontrolling the well voltage of a CMOS circuit when the power supply isturned on and when cut off, and during operation.

[0017] In one embodiment of the invention, in which the CMOS circuitincludes MOSFETs that cannot be cut off substantially satisfactorilyduring normal operation, after the well voltage is applied to the wellof the CMOS circuit so that the MOSFETs can be cut off, the supplyvoltage is applied to the CMOS circuit.

[0018] In another embodiment, after a third supply voltage (generatedfrom a first supply voltage by a voltage conversion circuit) is appliedas a well voltage to the well of the CMOS circuit, a second supplyvoltage is applied to the CMOS circuit.

[0019] In yet another embodiment, the invention provides a circuit forfixing the well potential of the CMOS circuit, and a circuit for varyingthe well potential of the MOSFETs by capacitive coupling according tothe variation of the input signal of the CMOS circuit.

[0020] In still another embodiment, the invention provides asemiconductor device that includes a dynamic memory cell comprising aMOSFET, a capacitor, and a CMOS circuit, wherein the well potential ofthe MOSFETs constituting the CMOS circuit is subjected to a pulsevariation, and wherein the substrate voltage of the dynamic memory cellis substantially a DC supply voltage.

[0021] In another embodiment, the invention provides a semiconductordevice including a static memory cell that is operated at a high voltageand is constituted by MOSFETs of high threshold voltage, and a CMOScircuit operated at a low voltage and constituted by MOSFETs having alow threshold voltage. The well potential of the MOSFETs constitutingthe CMOS circuit is subjected to a pulse variation.

[0022] In yet another embodiment, the invention provides a semiconductordevice including at least one CMOS circuit, a standby control circuit,and a voltage conversion circuit, wherein the voltage generated by thevoltage conversion circuit is supplied to the standby control circuit,and the standby control circuit varies the well potential of the CMOScircuit using the output of the voltage conversion circuit, depending onoperating conditions. A capacitor having a capacitance that is greaterthan the capacitance of the well is connected to the output of thevoltage conversion circuit.

BRIEF DESCRIPTION OF THE DRAWINGS

[0023]FIG. 1 illustrates a CMOS semiconductor device constructedaccording to the teachings of the present invention;

[0024]FIG. 2 is a chart of timing diagrams for the CMOS semiconductordevice shown in FIG. 1;

[0025]FIG. 3 illustrates a CMOS LSI chip constructed according to theteachings of the present invention;

[0026]FIG. 4 illustrates a section of the CMOS LSI chip of FIG. 3;

[0027]FIG. 5 illustrates a CMOS circuit constructed according to theteachings of the present invention;

[0028]FIG. 6 is a chart of timing diagrams for the CMOS circuit shown inFIG. 5;

[0029]FIG. 7 illustrates a layout for the circuit of FIG. 5;

[0030]FIG. 8(a) illustrates a sectional view taken along line VIII-VIIIof the layout shown in FIG. 7;

[0031]FIG. 8(b) illustrates a sectional view of another layout of thecircuit of FIG. 5, taken along line VIII′-VIII′;

[0032]FIG. 9 illustrates the selection and driving of a circuit subblockaccording to the present invention;

[0033]FIG. 10(a) illustrates a line selection circuit;

[0034]FIG. 10(b) illustrates a timing chart for the operation of thecircuit of FIG. 10(a);

[0035]FIG. 11 illustrates a CMOS inverter constructed according to theteachings of the present invention;

[0036]FIG. 12 is a chart of timing diagrams for the CMOS inverterillustrated in FIG. 11;

[0037]FIG. 13 is a layout for the circuit of FIG. 11;

[0038]FIG. 14 is a sectional view taken along XIV-XIV of the layoutshown in FIG. 13;

[0039]FIG. 15 shows a modification of the circuit diagram shown in FIG.11;

[0040]FIG. 16 shows another modification of the circuit of FIG. 11;

[0041]FIG. 17 illustrates an example of an application of the presentinvention to an inverter series;

[0042]FIG. 18(a) shows a PMOS NOR logic circuit constructed according tothe teachings of the present invention;

[0043]FIG. 18(b) shows an NMOS NOR logic circuit constructed accordingto the teachings of the present invention;

[0044]FIG. 19(a) shows an NMOS NAND logic circuit constructed accordingto the teachings of the present invention;

[0045]FIG. 19(b) shows another NMOS NAND logic circuit, in whichprecharged MOSFETs share a common well;

[0046]FIG. 19(c) shows a PMOS NAND logic circuit constructed accordingto the teachings of the present invention;

[0047]FIG. 20(a) shows an input buffer employing onlyhigh-threshold-voltage MOSFETs;

[0048]FIG. 20(b) shows an input buffer employing low-threshold-voltageMOSFETs with high-threshold-voltage MOSFETs serving as switches;

[0049]FIG. 21(a) shows a data output circuit constructed according tothe teachings of the present invention;

[0050]FIG. 21(b) shows timing diagrams for the circuit of FIG. 21(a);

[0051] FIGS. 22(a) and 22(b) show well driving circuits constructedaccording to the teachings of the present invention;

[0052]FIG. 23 shows a technique for applying a well voltage according tothe present invention;

[0053]FIG. 24 shows a conventional negative voltage power supplycircuit;

[0054]FIG. 25 shows a conventional booster power supply circuit;

[0055]FIG. 26 shows a conventional step-down voltage power supplycircuit;

[0056]FIG. 27 shows an arrangement of a dual-power-supply chipconstructed according to the teachings of the present invention;

[0057]FIG. 28 shows a single-power-supply chip constructed according tothe teachings of the present invention;

[0058]FIG. 29 shows another single-power-supply chip constructedaccording to the teachings of the present invention;

[0059]FIG. 30 shows another arrangement of a dual-power-supply chipconstructed according to the teachings of the present invention; and

[0060]FIG. 31 shows the internal circuit of a dual-power-supply chipconstructed according to the teachings of the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0061] In the preferred embodiment illustrated in FIG. 1, a circuitblock CT1 operating with a high supply voltage V_(CC1) (e.g., 3.3 V)employs MOSFETs each having a selectable threshold voltage V_(T) as highas 0.5 V, for example, during operation. Since the supply (operating)voltage is sufficiently high, high-speed operation is possible withoutdropping the threshold voltage to 0.1 V or thereabouts. Therefore, anysubthreshold current that exists is sufficiently small to be ignored,without especially switching the threshold voltage during normaloperation to the standby voltage, whereby the source of the transistorand its substrate can be connected at a common voltage.

[0062]FIG. 1 also shows a substrate voltage generating and controlcircuit VB, which is operated with control signals φ_(P), φ.

[0063] A circuit block CT2 operating with a low supply voltage V_(CC2)(e.g., 1.8 V), on the other hand, has internal transistors that areoperated at high speed by dropping their threshold voltage to, forexample, 0.1 V during normal operation. At standby, the thresholdvoltage must be increased to, for example, 0.5 V so as to reduce thestandby current. The control of the threshold voltage is effected bycontrolling the substrates NW, PW of the transistors.

[0064] The substrate voltage of the transistors in the circuit block CT2is controlled as shown in FIG. 2.

[0065] The voltages V_(BP), V_(BN) of the substrates NW, PW are producedon the basis of the 3.3 V initially applied as V_(CC1), and the voltagesare selected to have a value sufficient for the transistors in thecircuit block CT2 to be cut off during the low-voltage operation. Forexample, V_(BP) can be set at 3.3 V, and V_(BN) at −1.5 V.

[0066] First, the substrate voltage is applied to the circuit block CT2,and then the low supply voltage V_(CC2) is applied thereto.Consequently, since the threshold voltage of the transistors in thecircuit block CT2 becomes sufficiently high in the course of applyingthe low supply voltage, no excessive chip current appears because thesubthreshold current from each transistor is accumulated, and nolatching-up occurs because the supply voltage of each transistor nevercomes into a floating state of about 0 V.

[0067] Then, the operation is changed to the normal operation bydecreasing the voltages V_(BP), V_(BN) of the substrates NW, PW (to, forexample, 2.3 V and −0.5 V or thereabout) in order to lower the thresholdvoltage of the transistors in the circuit block CT2. The thresholdvoltage is increased by boosting the substrate voltages V_(BP), V_(BN)(to e.g., 3.3 V and −1.5 V) at standby, when a clock in the circuitblock is stopped (fixed to a high or low level), at the time ofsleeping, or at the time of non-selection of the chip, whereby anincrease in power consumption due to the subthreshold current isreducible.

[0068] When the power supply is cut off, the substrate voltages V_(BP),V_(BN) are sufficiently boosted, and then the supply voltage V_(CC2) isturned off. Further, the supply voltage V_(CC1) is also turned off.Thus, the order of application of the supply voltages is as follows: atimer sets a time interval following the application of the high supplyvoltage V_(CC1), and then the low supply voltage V_(CC2) is input.

[0069] The circuit blocks CT1 and CT2 may be constituted by differentsemiconductor chips, or they may be integrated onto a single chip.

[0070]FIG. 3 shows an embodiment of the present invention in which thecircuit block CT1 and the circuit block CT2 are integrated onto onechip. In FIG. 3, an interface circuit I/O interfaces with the exteriorof the chip; circuit blocks LG1-LG4 control the substrate voltage andare constituted by circuits that include transistors of low thresholdvoltage; a static memory SRAM includes a memory array SARY constitutedof static memory cells; a power supply voltage V_(CCS) supplies power tothe memory cells; and a dynamic memory DRAM includes a memory arrayconstituted by dynamic memory cells, each having MOSFETs and acapacitor, on one electrode of which is a capacitor electrode voltageV_(P). In the static and dynamic memory cells, DL, /DL represent datalines, and WL represents a word line. The memory arrays SARY and DARYmay be constituted by transistors having a high threshold voltage,although such are not required.

[0071] VB denotes a substrate-voltage generating circuit, which iscontrolled by a group of signals (φ_(P), /φ_(P), φ₁, /φ₁, φ₂, /φ₂, φ₃,/φ₃, φ₄, /φ₄) from a substrate-voltage control circuit CLG; and VBAdenotes a substrate-voltage generating circuit for supplying substratevoltages V_(PS), V_(NS), V_(ND) in the memory array SARY and in thememory array DARY. Each of the substrate voltages V_(PS), V_(NS), V_(ND)is normally a DC voltage or a semi-DC voltage (that is, a DC voltagewith an AC ripple).

[0072] The principal portion of the circuit block CT1 including thesubstrate-voltage generating circuit VB, the substrate-voltage controlcircuit CLG, and the substrate-voltage generating circuit VBA, isconstituted by MOSFETs of high threshold voltage. Moreover, a highsupply voltage V_(CC1) is supplied to the interface circuit I/O and thesubstrate-voltage generating circuit VB, whereas a low supply voltageV_(CC2) is supplied to the other circuit blocks.

[0073] The memory arrays SARY and DARY receive their substrate voltagesin a different manner, because of the high density of the memory cellsthat make up the arrays (a high-density array is generally preferablebecause its area accounts for a large percentage of the area of thewhole chip). For the high density of cells, the element isolation widthneeds narrowing. However, because the substrate bias system oridnarillygives a substrate voltage which is constant, with a substantially DCcurrent, to the whole of the memory array simultaneously, the powerconsumption of the whole chip increases due to the large substratecapacitance. Thus, the element isolation characteristics aredeteriorated when the substrate capacitance of this portion is driven.Therefore, the substrate voltages V_(NS), V_(PS) in the memory arraySARY are set at 0 V, respectively, and a voltage equal to the supplyvoltage V_(CCS), and the substrate voltage V_(ND) in the memory arrayDARY is substantially a DC voltage of about −1.5 V.

[0074] The memory cells in the memory array SARY are flip-flops. If thethreshold voltage of a transistor forming one of the flip-flops is toolow, the subthreshold current in the memory cell increases. Since thememory array SARY is constituted by a number of cells, the currentrequired for the memory array SARY as a whole amounts to a large value.Consequently, the cells are caused to operate at high speed by settingnot only the threshold voltage of the transistor in each cell to be ashigh as about 0.5 V, but also to set a high supply voltage V_(CCS)corresponding to the high threshold voltage. For example, the supplyvoltage V_(CCS) can be effectively set to the supply voltage V_(CC1)(3.3 V), which is higher than the supply voltage V_(CC2) (1.8 V) becausethe number of power supplies is not increased.

[0075]FIG. 4 is a schematic diagram of a sectional structure of therepresentative device of FIG. 3. In FIG. 4, capacitors in the memoryarray portion of the static memory SRAM and the memory array portion ofthe dynamic memory DRAM are omitted to make the drawing easy tounderstand.

[0076] Next, a description will be given of the application of theinvention to each interior circuit block shown in FIG. 3.

[0077]FIG. 5 illustrates an embodiment of the present invention appliedto a sub-circuit block LG (e.g. any of LG1-LG4) of FIG. 3. The substratevoltages (of substrates NW, PW) of the low-threshold voltage MOSFETs inthe circuit block CT2 are controlled by the circuit block CT1 and acircuit block /CT1. According to this embodiment, capacitors C_(P) andC_(N) are employed in the control. The substrate-voltagegenerating/controlling circuit VB generates and outputs control signals(φ_(P), φ, /φ_(P), /φ) and the substrate bias voltages (V_(BP), V_(BN))from the high supply voltage V_(CC1) (e.g., 3.3 V). A p-channeltransistor (PMOSFET) Q_(PP) and an n-channel transistor (NMOSFET) Q_(PN)have high threshold voltages.

[0078] The timing diagrams of FIG. 6 explain the operation of thecircuit shown in FIG. 5. The substrate bias voltages V_(BP), V_(BN) aregenerally produced by the substrate-voltage. generating/controllingcircuit VB on the basis of the 3.3 V initially applied, and thus adescription will be given of an example of substituting V_(CC1) (3.3 V)directly for the substrate bias voltage V_(BP).

[0079] First, the substrate bias voltage V_(BP) is applied to thecircuit block CT2, and then the low supply voltage V_(CC2) is applied tothe circuit block CT2. Therefore, the threshold voltage of eachtransistor in the circuit block CT2 is sufficiently high, as high as 0.5V for example, in the course of applying the low supply voltage V_(CC2).Thus, the pn junction is not biased in the forward direction.Consequently, the subthreshold current from the respective transistorsdoes not accumulate and become an overcurrent, and no latching-upoccurs.

[0080] When the circuit enters normal operation, the control signalsφ_(P) and /φ_(P) are respectively set at a high voltage level H and alow voltage level L, so as to turn off the transistors Q_(PP), Q_(PN);then, the control signals φ_(P) and /φ_(P) are respectively set at L andH. Thus, the capacitor coupling (C_(P), C_(N)) causes the substratevoltages on the substrates NW, PW to change to, for example, about 2.3 Vand −0.5 V, respectively. Since the voltage of the substrate decreases,the threshold voltage of each transistor in the circuit block CT2 alsodecreases and high-speed operation is made possible.

[0081] In order to change the operation from this state to standby,sleeping, or non-selection of the chip, the control signals φ_(P) and/φ_(P) are respectively set at L and H to turn on the transistorsQ_(PP), Q_(PN); then, the control signals φ_(P) and /φ_(P) arerespectively returned to H and L. Since a deep voltage is applied to thesubstrate, the threshold voltage of each transistor in the circuit blockCT2 becomes as high as 0.5 V. Consequently, the power consumption can beprevented from increasing because of the subthreshold current.

[0082] Varying the substrate voltage according to the operating mode isadvantageous in that it can be performed instantly by capacitivecoupling through the capacitors C_(P), C_(N). However, the substratevoltage gradually decreases due to the pn junction leakage current ofthe source and drain, or the substrate current of the MOSFET.Particularly, the substrate current becomes large in proportion to theoperating frequency.

[0083] The substrate (well) refresh shown in FIG. 6 is the operation ofresetting the potential to 2.3 V and −0.5 V. The refresh operation isperformed by, though not limited to, monitoring the substrate voltage.Alternatively, the time of refresh can be determined by a timer. Therefresh operation is constituted by placing the circuit from the normaloperating state into the standby state, and then returning the circuitto the normal operating state again. Varying the refresh intervalaccording to the magnitude of the substrate current (for example, makingthe refresh interval shorter when the chip is to perform a high-speedoperation than when it is to perform a low-speed operation) is effectivein improving the reliability of the operation.

[0084]FIG. 7 shows an example of a layout of the transistors Q_(PP),Q_(PN) and the capacitors C_(P), C_(N) of FIG. 5. FIG. 8(a) is asectional view taken along the lines VIII-VIII of the layout of FIG. 7.FIG. 8(b) is a sectional view taken along the lines VIII′-VIII′ of thelayout of FIG. 7. The substrate bias voltages V_(BP), V_(BN) areconnected to the sources of the transistors Q_(PP), Q_(PN) via a secondwiring layer (second metal wiring layer), respectively. The drains oftransistors Q_(PP), Q_(PN) are connected to the second wiring layer andoutput the substrate voltages to the substrates NW, PW of the maincircuit. Moreover, the capacitors C_(P), C_(N) are MOS capacitances.

[0085]FIG. 9 shows an application of FIG. 5, in which one of twosub-circuit blocks CT2(l), CT2(2) is selectively driven. In a selectedsub-circuit, for example, only the substrate-voltage generating circuitsCT1(1), /CT1(1) associated with the sub-circuit block CT2(1) areselectively driven by a well block selection signal WB and a start clockφ, and the voltages of the wells NW(1), PW(1) which belong thereto aredriven so that the threshold voltages of the MOSFETs in CT2(1) aredropped. Since the wells of the non-selected sub-circuit block CT2(2) isnot driven, on the other hand, the threshold voltage of the MOSFETs inthe sub-circuit block CT2(2) remains high.

[0086] If the division-selection driving is not effected as describedabove, the entire well of the sub-circuit block CT2(1) and thesub-circuit block CT2(2) needs driving, and the subthreshold currentmade to flow by the low threshold voltage during the normal operation iscaused to flow from all of the MOSFETs in the sub-circuit block CT2(1)and the sub-circuit block CT2(2). Therefore, in this embodiment of theinvention, the power and the subthreshold current accompanying the pulsedriving are also halved.

[0087]FIG. 10 shows an example in which the circuit of FIG. 9 is appliedto the line decoders of the memory arrays SARY and DARY and drivers. Thememory arrays are normally divided into a number of sub-arrays, and theline decoders as well as the word-line driving circuits (word drivers)are disposed so as to correspond to respective sub-arrays. Since only afew sub-arrays are actually selected and driven, the line decodersbelonging to the selected sub-arrays and the well of the MOSFETs in theword driver are driven so that the threshold voltage is decreased, andmost of the line decoders and the wells of the non-selected sub-arraysare not driven (so as to maintain a high threshold voltage), whereby thepower consumption and the subthreshold current as a whole are sharplydecreased.

[0088] In FIG. 10, two exemplary sub-arrays ARY1, ARY2 are shownconceptually. The sub-arrays ARY1, ARY2 have 128 word lines WL and aplurality of data lines DL (only one is shown for simplicity). A memorycell MC is connected at the intersection of a word line and a data line.To each word line WL, a word driver drv and a line decoder dec areconnected. The word driver drv comprises a CMOS inverter Q_(DP), Q_(DN).The line decoder dec is a NAND logic circuit with the NMOSFETs connectedin series, and each gate is supplied with internal address signals ai, .. . , aj and the like.

[0089] While an external clock is asserted (3.3 V), the line decoder isprecharged. When the clock CLK is changed to L (0 V), the PMOSFET Q_(PP)is turned off and the internal address signal is changed from 0 V to 1.8V or 0 V, depending on the logical condition of the external address Ai,. . . , Aj. In the case of an address signal for selecting the word lineWL₁, for example, all of the NMOSFETs of the decoder dec connected tothe word line WL₁ and the input of the word driver drv are discharged to0 V, so that the PMOSFET Q_(DP) is turned on. Consequently, a pulsevoltage of 1.8 V is applied to the word line WL₁. When the wells NW(1),PW(1) in the circuit block CT2(1) including the selected word line WL₁are driven so that the threshold voltage is decreased, the time requireduntil the pulse is applied from the decoder dec to the word line WL₁ canbe shortened. Further, since the well in the non-selected circuit blockCT2(2) is not driven, an increase in the power and the subthresholdcurrent accompanying the pulse driving never occurs. A well blockselector selects the driving of the well in one of the circuit blocksaccording to the internal address signal.

[0090]FIG. 11 shows an embodiment of the present invention in the formof one inverter for use as the circuit block CT2 of FIG. 5, wherein thecontrol signals φ and /φ are generated from an input signal In. When thelevel of the input signal In is changed from L to H, the voltages of thesubstrates (NW, PW) are increased because of the coupling by therespective capacitors C_(P), C_(N). Therefore, the subthreshold currentbecomes small as the threshold voltage of the NMOSFET increases.Moreover, the load driving ability of the inverter increases as thethreshold voltage of the NMOSFET decreases.

[0091] When the level of the input signal In is changed from H to L, thesubstrate voltages are conversely decreased. Therefore, the thresholdvoltage of the PMOSFET is lowered and the load driving abilityincreases. Moreover, the threshold voltage of the NMOSFET increases,whereby the subthreshold current is decreased. Thus, the thresholdvoltages of the MOSFETs are automatically varied by the input signal,and the load driving capability of the inverter can be increased whilethe subthreshold current is suppressed.

[0092] The control signals φ_(p) and /φ_(p) are used when the powersupply is turned on or for refreshing the substrate (well), as shown inFIG. 5.

[0093]FIG. 12 shows a detailed timing chart in connection with theoperations described above. V_(TP) and V_(TN) are the threshold voltagesof the respective PMOSFET and NMOSFET, and these are separatelyexpressed herein. The highest and lowest voltages of the wells (NW, PW)are clamped to V_(BP)+V_(TP), V_(BN)−V_(TN) since the transistorsQ_(PP), Q_(PN) serve as diodes.

[0094]FIG. 13 shows an example of a layout of the circuit of FIG. 11.FIG. 14 is a sectional view taken along lines XIV-XIV of the layout ofFIG. 11. The transistors Q_(PP), Q_(PN) are formed separately from thewells, and the capacitors C_(P), C_(N) are materialized by extendingeach of the gate electrodes up to a high-concentration surface layer,which supplies power to the substrate.

[0095]FIG. 15 shows another circuit embodiment of the present invention,which provides the same function as that of the circuit of FIG. 11. Thecapacitors C_(P), C_(N) are connected via an inverter series INV. Theinverter series INV may be constituted by high-V_(T) MOSFETs or bylow-V_(T) MOSFETs, though the ratio of gate width W to gate length L issmall. Although the input capacitance of the inverter of FIG. 11 isincreased by the capacitors C_(P), C_(N), the increase in the inputcapacitance can be suppressed, since the inverter becomes a buffer inthis embodiment of the invention.

[0096]FIG. 16 shows an embodiment in which two inverter series INV arecombined, wherein the input capacitance and the area are furtherreduced.

[0097]FIG. 17 shows an application of plural inverter series like thatillustrated in FIG. 15. In FIG. 17, a circuit is shown in whichinverters IV1, IV2, IV3, IV4 are connected in series. A smaller area iseffectively accomplished as the transistors Q_(PP), Q_(PN) and thecapacitors C_(P), C_(N) are commonly used by the plurality of inverterseries. In other words, though the substrate requires two kinds of wellwiring, with every well connected by a wire, in order to decrease thethreshold voltages of the MOSFETs caused to conduct and increase thethreshold voltages of those caused not to conduct, the inverters IV2 andIV4 commonly use transistors Q_(PP1), Q_(PN1), a combination ofINV+capacitor C_(P), and a combination of INV+capacitor C_(N), whereasthe inverters IV1 and IV3 commonly use transistors Q_(PP2), Q_(PN2),another combination of INV+capacitor C_(P), and another combination ofINV+capacitor C_(N). The common usage like this is applicable to any ofthe embodiments shown in FIGS. 11 and 16.

[0098] FIGS. 18(a)-18(b) show examples of applying the circuit of FIG.11 to NOR logic circuits. In the PMOS circuit of FIG. 18(a), an outputOut changes from L to H when the level of at least one of the inputs(I₁, I₂) becomes L. In the NMOS circuit of FIG. 18(b), the output Outchanges from H to L when the level of at least one of the inputs (I₁,I₂) becomes H.

[0099] FIGS. 19(a)-19(c) show examples of applying the circuit of FIG.11 to NAND logic circuits. The output Out is initially precharged at 1.8V with the precharged signal φ_(P) and the PMOSFETs at low thresholdvoltages, and the inputs (I₁, I₂) are all L (0 V). When all inputsbecome H (1.8 V), then, the series-connected NMOSFETs are caused toconduct and the output is discharged to 0 V. This circuit is applicableto the line decoder of FIG. 10.

[0100] Further, FIG. 19(b) shows a case where the area is decreased byproviding the precharged MOSFETs with a common well. Even when thecapacitance of the well becomes doubled in comparison with that of FIG.19(a), the well is driven by the input I₁ and the two capacitorsconnected to the input I₂. Therefore, the output Out can be dischargedquickly as the variation of the well potential is equalized to that ofFIG. 19(a).

[0101] The NAND circuit of FIG. 19(c) is constituted by PMOSFETs. Whenthe inputs I₁, I₂ simultaneously become L, the output Out that has beenprecharged to 0 V is changed to H.

[0102] A description will subsequently be given of an application of thepresent teachings to the interface circuit I/O of FIG. 3.

[0103] FIGS. 20(a) and 20(b) show input buffers (In) from the outside ofthe chip. In FIG. 20(a), there is shown a well-known circuit usingMOSFETs operating at a voltage of 3.3 V and having a high thresholdvoltage V_(T). In FIG. 20(b), there are shown MOSFETs of low thresholdvoltage V_(T) used for transistors Q_(P), Q_(N). The transistors Q_(PP),Q_(PN) serve as switches, and have a high threshold voltage. Thetransistors Q_(PP), Q_(PN) are held off when the input buffer is notneeded, and the subthreshold current of the transistors Q_(P), Q_(N) isprevented from flowing between the supply voltage V_(CC1) and ground.The transistors Q_(PP), Q_(PN) are turned on when an effective signal isinput.

[0104] FIGS. 21(a) and 21(b) show a case where the circuit of FIG. 11 isapplied to the data output stage of the interface circuit I/O. As isoften used in a dynamic memory (DRAM) chip for general use, the dataoutput stage in the interface circuit I/O is constituted by, forexample, NMOSFETs of the same polarity, and driven by a low supplyvoltage V_(CC2) in this example. The output (Dout) portion is in theform of a wired-OR circuit in which a plurality of similar output buffercircuits are connected in common.

[0105] In the case of the wired-OR connection, when any one of theselected output circuits is feeding data to the commonly connectedoutput portion Dout, the other output buffer circuits are completelyoff. When all the output buffer circuits are de-selected, the commonoutput (Dout) portion is completely off. In order to accomplish thisoperation in the low-operating voltage, low-threshold voltage operation,the above-described invention is effective.

[0106] In FIG. 21(a), transistors Q_(N1), Q_(N2) are low-V_(T) NMOSFETsat the output stage, and transistors Q_(PN1), Q_(PN2) for use inapplying the substrate (well) voltage thereto are PMOSFETs of highthreshold voltage. This circuit is characterized in that the thresholdvoltage of the output stage MOSFETs (Q_(N1), Q_(N2)) is varied accordingto information on a pair of data output signals do, /do. First,substrates PW1, PW2 are precharged to the potential of the substratebias voltage V_(BN) by turning on the transistors Q_(PN1), Q_(PN2). Thesubthreshold current made to flow between the transistors Q_(N1),Q_(N2), Q_(N) is set to a value that can be ignored. Then data is fed tothe output Dout when the output signals do, /do become the combinationof H and L or L and H according to the information. The thresholdvoltage of the conducting NMOSFET then becomes lowered because of thecoupling by the capacitor, and the load driving capability is improved,ensuring a high-speed operation. Since the threshold voltage of theother NMOSFET (which is not driven) remains at the high level, thesubthreshold current can be ignored.

[0107] FIGS. 22(a) and 22(b) show specific examples of well (NW) drivingcircuits. FIG. 22(a) shows an example in which a CMOS inverter generatesthe control signal φ of FIG. 5. By adjusting the ratio of the parasiticcapacitance of the well to that of the capacitor C_(P), the voltage (2.3V) of the well W of FIG. 6, for example, can be generated. FIG. 22(b)shows a circuit for applying a supply voltage of 2.3 V directly to thewell NW without using the capacitor C_(P). The control signal φ rangesfrom 0 V to 3.3 V, and the source voltage of the transistor Q_(N) is 2.3V. Therefore, the transistor Q_(N) can be cut off satisfactorily whenthe control signal φ is 0 V and the transistor Q_(N) has a low thresholdvoltage. When the level of the control signal φ becomes 3.3 V, the wellNW can be driven at high speed because of the low threshold voltage. Inthis case, the 2.3 V source voltage can be produced by stepping down theexternal voltage 3.3 V within the chip.

[0108]FIG. 23 shows still another embodiment of the present invention.VB1, VB2 represent circuits (as will be described later) for generatingthe substrate (well) voltage from the supply voltage V_(CC1) within thechip. High-V_(T) MOSFETs. Q_(PP), Q_(PN) serve as switches that areturned on when the substrate voltage thus generated is applied to thesubstrate of the MOSFETs in the main circuit (for example, at the timeof standby or the like as described above).

[0109] Further, capacitors C_(BP), C_(BN) are substrate capacitors ofthe MOSFETs in the main circuit. As capacitors C_(PP), C_(PB) arearranged to have values sufficiently greater than those of thecapacitors C_(BP), C_(BN), the fluctuation of the substrate voltage isminimized even when the above switches are turned on. Together withother circuits, these capacitors may be mounted on the same chip orrealized as tantalum capacitors and electrolytic capacitors outside thechip.

[0110] When these capacitors are formed outside the chip, nodes N1, N2in FIG. 23 serve as packaging terminals and, because the capacitors areexternally fitted thereto, the number of terminals increases. However, alarge capacitance becomes readily obtainable. Consequently, thesubstrate voltage required in the standby state can be set quickly sinceit is only necessary to transfer part of the large amount of chargeprestored in the capacitors C_(PP), C_(PB) to the capacitors C_(BP),C_(BN).

[0111] Since the capacitance of the power supply of thesubstrate-voltage generating circuits VB1, VB2 is generally small, noproblem arises from charging the capacitors C_(BP), C_(BN) therethrough.The required substrate voltage may also be applied directly to the nodesN1, N2 from the outside via the packaging terminals without using thesubstrate-voltage generating circuits VB1, VB2.

[0112]FIGS. 24-26 are conceptual diagrams of power supplies forgenerating the substrate bias voltage V_(BN), the substrate bias voltageV_(BP), and the step-down voltage V_(CL), use of which has been setforth above. A detailed description of this circuit has been given in“Cho-eluesuai” (written by Sumio Itoh, published by Baifukan on Nov. 5,1994, pp 239-328).

[0113]FIG. 24 shows a circuit for producing a negative supply voltage(e.g., −1.5 V) based on a power supply of 3.3 V, using a ring oscillatorand a diode-connected MOSFET.

[0114]FIG. 25 shows a circuit for producing a booster supply voltage of3.3 V or higher using the ring oscillator on the chip. Although adescription has been given on the assumption of V_(BP)=3.3 V, thebooster power supply is unnecessary in this case. As the value of thesubstrate bias voltage V_(BP) is determined by the characteristics ofthe MOSFETs, however, a booster power supply with V_(CC1) (3.3 V) orhigher is generally required.

[0115]FIG. 26 shows a circuit for obtaining the step-down voltage V_(CL)(2.3 V) by the use of the 3.3 V power supply. The value of the step-downvoltage V_(CL) may be determined by a reference voltage V_(REF)generated on the chip, and a comparator.

[0116] Although descriptions have been given primarily of examples ofapplications for the internal circuit of FIG. 3, the present inventionis not limited to these exemplary applications. FIG. 27 is anillustration resulting from simplifying the embodiment of the presentinvention shown in FIG. 3, which will be used to describe still anotherembodiment thereof.

[0117] In FIG. 27, the interface circuit I/O is constituted mainly byMOSFETs having high threshold voltages, and is supplied with a highsupply voltage V_(CC1). The high supply voltage V_(CC1) (>V_(CC2)) isalso applied to the substrate-voltage generating circuit VB so as togenerate substrate bias voltages V_(BP), V_(BN). The main circuit isconstituted by MOSFETs of low threshold voltage, and is supplied with alow supply voltage (V_(CC2)).

[0118] As described above, the interface circuit I/O need not beconstituted by high-V_(T) MOSFETs, and the main circuit also need notalways be constituted by low-V_(T) MOSFETs. Moreover, instead ofsupplying the substrate bias voltage V_(BP) to the main circuit asshown, the supply voltage V_(CC1) may be directly supplied to the maincircuit as the substrate bias voltage V_(BP) if the threshold voltageV_(T) of the PMOSFETs in the main circuit is sufficiently high.

[0119]FIG. 28 shows an example of the present invention arranged on asingle chip and employing a single power supply, with additionalreference to FIG. 2. A substrate bias monitor circuit DT is used fordetecting the substrate potential, to ensure a sufficiently stable powersupply when the power supply is turned on. The detected output turns onthe high-V_(T) PMOSFET, whereby the interface circuit I/O and the maincircuit are supplied with the supply voltage V_(CC).

[0120]FIG. 29 shows an embodiment in which a step-down voltage powersupply circuit VD is employed. The step-down voltage power supplycircuit VD produces a low supply voltage V_(CL) from the high supplyvoltage V_(CC), and supplies the voltage to the main circuit. With thesingle power supply V_(CC), the step-down voltage V_(CL) (applied afterthe substrate bias voltages V_(BP), V_(BN) are applied) and thesubstrate bias voltages V_(BP), V_(BN) are made internally adjustable sothat an optimum operating voltage may be attained for the devicesconstituting the main circuit.

[0121]FIG. 30 shows an exemplary system that gives the user norestriction on the order in which the power supply is turned on, even inthe case where two kinds (V_(CC1), V_(CC2)) of external power supply areemployed.

[0122] The main circuit, which uses low-V_(T) MOSFETS, very often isoperated with the low voltage power supply (V_(CC2)) by applying thepresent invention shown in FIG. 28. On the other hand, the interfacecircuit I/O, which uses MOSFETs of high threshold voltage V_(T), isoperated with the other supply voltage (e.g., V_(CC1)). As there existsa difference in operating voltage between the interface circuit I/O andthe main circuit, a small-scale voltage-level conversion circuit isrequired. However, the circuit block operating with the supply voltageV_(CC1) and the circuit block operating with the supply voltage V_(CC2)operate substantially independently, thus preventing the main circuitfrom being latched up.

[0123]FIG. 31 shows the internal circuitry for the embodiment shown inFIG. 30, and corresponds to the internal circuitry shown in FIG. 5. Inthis example, it is assumed that the interface circuit I/O operates witha high voltage power supply of 1.8 V and the main circuit with a lowvoltage power supply of 1.2 V. A booster (V_(BP)=2.7 V) power supply isformed in a booster circuit operating with the supply voltage V_(CC2),and the control signal φ_(P) has a pulse width ranging from 0 V up tothe substrate bias voltage V_(BP). Further, the control signals φ, /φhave a pulse width ranging from, for example, 0 V up to the substratebias voltage V_(BP). V_(BN) (−1.5 V) is produced by the negative voltagesupply voltage circuit, and the control signal /φ_(P) has a pulse widthranging from 0 V up to the substrate bias voltage V_(BP). Therefore, thetransistors Q_(PP), Q_(PN) are turned on when the supply voltage V_(CC2)is applied and a sufficient well voltage is supplied to the low-V_(T)transistors Q_(P), Q_(N), whereby the transistor Q of FIG. 30 is turnedon and the supply voltage V_(CC2) is applied to the main circuit of lowthreshold voltage V_(T) of FIG. 31 (as the application is effected laterthan the application of V_(CC2), it is distinguished from V_(CC2)).

[0124] In the above-described embodiments of the present invention, thesubstrate structure as well as the structure of transistors is notespecially restricted. For example, MOSFETs of the SOI (Silicon(Semiconductor) on Insulator) structure may be used, so long as theirthreshold voltages V_(T) are controllable by the substrate voltage. Thehigh reliability of the chip as a whole is assured by making thethickness of the gate oxide film of the MOSFETs to which a high supplyvoltage (e.g., Vcc1) is applied, greater than the thickness of the gateoxide film of the MOSFETs to which a low supply voltage (e.g., Vcc2) isapplied.

[0125] Although there has been shown an example of integrating all sortsof functional blocks in FIG. 3, the present invention is applicable toindependent chips including, for example, a dynamic memory (DRAM) chip,a static memory (SRAM) and a microprocessor chip.

[0126] Various modifications of the present invention will becomeapparent to those of ordinary skill in the art. All such modificationsthat basically rely upon the teachings through which the invention hasadvanced the state of the art are properly considered within the spiritand scope of the invention.

1-25. (Canceled).
 26. A semiconductor integrated circuit devicecomprising: an interface circuit including a first MOSFET having a firstthreshold voltage; a main circuit including a second MOSFET having asecond threshold voltage lower than the first threshold voltage; and asubstrate bias voltage generator to generate a substrate bias voltagefor the second MOSFET, wherein the interface circuit is arranged to besupplied with a first supply voltage and the main circuit is arranged tobe supplied with a second supply voltage lower than the first supplyvoltage, and wherein the substrate bias voltage generator is arranged tobe supplied with the first supply voltage.
 27. The semiconductorintegrated circuit device according to claim 26, wherein both the firstsupply voltage and the second supply voltage are supplied from anexternal device of the semiconductor integrated circuit device.
 28. Thesemiconductor integrated circuit device according to claim 26, furthercomprising: a step-down voltage power supply circuit to produce thesecond supply voltage from the first supply voltage, wherein the firstsupply voltage is supplied from an external device of the semiconductorintegrated circuit device.
 29. The semiconductor integrated circuitdevice according to claim 28, wherein the second supply voltage issupplied to the main circuit after the substrate bias voltage issupplied to the main circuit.
 30. The semiconductor integrated circuitdevice according to claim 27, further comprising: a substrate biasmonitor circuit to monitor a value of the substrate bias voltage; and athird MOSFET to control a power supply to the main circuit, wherein thethird MOSFET is controlled to turn on when the substrate bias monitorcircuit detects that the substrate bias voltage is ensured to besufficiently stable.
 31. The semiconductor integrated circuit deviceaccording to claim 30, wherein a threshold voltage of the third MOSFETis higher than the second threshold voltage.